Ultra Clean Technology's Catalytic Steam Generation System (CSGS) delivers ultra-high purity (UHP) steam at the point of use (POU) for critical semiconductor process applications. The CSGS converts hydrogen and oxygen gases into steam in a truly catalytic reaction, in contrast to less reliable steam sources that merely vaporize water. Current CSGS designs flow up to 3 slm at 1-100% concentration, with the ability to set hydrogen-rich or oxygen-rich ratios as may be needed for production processes based on surface-driven reactions.

CSGS units have been delivered to customers working on advanced front-end of line (FEOL) processes such as oxidation and transistor gate formation (using ALD and MOCVD), as well as challenging back-end of line (BEOL) processes such as resist-strip/ash over low-k materials. In addition, this technology has applications in post-etch and advanced surface passivation.

This catalyst-based steam generation system offers strong advantageser to lower cost operation, wider flow ranges and concentrations, inherently stable control with simple air cooling, and multiple physical integration options.