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FOR IMMEDIATE RELEASE
Editorial Contact: Nancy C. Nelson
Ultra Clean Technology
650.617.4147
Email: ncnelson@uct.com

July 22, 2002
 
ULTRA CLEAN TECHNOLOGY (UCT) UNVEILS
BREAKTHROUGH, CATALYTIC HIGH PURITY WATER VAPOR GENERATION TECHNOLOGY.
 

MENLO PARK, CA, July 22, 2002 — Ultra Clean Technology, a global leader in integrated, ultra pure gas and liquid delivery solutions for semiconductor manufacturing, today unveiled the new UCT Steam Generation System.

This industry breakthrough in rapid thermal process (RTP) oxidation technology is targeted for a variety of 200-300mm wafer applications. Designed to facilitate some of the core processes in the manufacture of semiconductors, the UCT Steam Generation System can be utilized in the ashing process for front-end-of-line pre-cleans and high density ion implant resist removal. Excellent for the photo resist removal process, the system is highly effective for additional back-end-of-line cleaning processes including de-veil and side-wall photo resist removal. This new technology may also be utilized in post-etch, advanced surface passivation. A system module will be on display at Semicon West 2002 (booth #4344) in the Esplanade Ballroom, Moscone Center, July 22-24, 2002.

Advantages of SGS over conventional DI water systems
Unlike conventional pyrogenic steam systems that use a torch to combust hydrogen and oxygen to produce steam, the UCT system relies on a unique, low temperature (<300ºC) catalytic process for steam generation. The result is an extremely reproducible steam supply that is highly customizable to accommodate a wide variety of process requirements. The SGS will facilitate excellent process recipe flexibility as it delivers extremely controllable steam concentrations and flow rates. This level of process control (>99.0% reaction efficiency) is near impossible using conventional pyrogenic systems as output is difficult to characterize accurately. Cold start-up time is less than ten minutes; response time at operating temperature is less that ten seconds.

SGS virtually eliminates contamination
Pyrogenic steam systems use a high temperature process which can result in contamination. In contrast, the new low temperature SGS eliminates concerns over metallics and corrosion. The SGS is a contamination-free process that can contribute significantly to the goal of defect reduction. The new system features a modular design which is very scalable and engineered to meet numerous process requirements. To further reduce overall cost of ownership, the new SGS does not require the use of DI water, thus eliminating the expense associated with this requirement. The system is air-cooled and eliminates many of the difficult repair issues common to pyrogenic steam generators resulting in a high mean time to repair.

Easy-to-integrate design featuring a small footprint
Due in large measure to its compact, straight-forward design the new SGS from Ultra Clean Technology is very easy for original equipment manufacturers (OEM) to integrate. The Catalytic Steam Generation system weighs 40 lbs. and measures only 12"x12"x15". The catalyst is non-toxic, insoluble in water, non-decomposing (to 1000ºC) and stable at ambient. The catalyst module itself is 1.5" in diameter and 5" in length. Safety features include thermocouples with temperature control, over-temperature thermostats, thermal fuses; all interlocked to pneumatic lines for gas flow. H2 is sensored at the outlet. The system may be configured for use with N2 if required.

 
About Ultra Clean Technology Systems and Service, Inc.

Founded in 1991, Ultra Clean Technology (UCT) is an internationally recognized leader in the design, engineering, and manufacture of gas and liquid delivery systems for semiconductor process equipment manufacturers and device makers. Headquartered in the Menlo Park, CA, UCT has additional design and manufacturing facilities in Austin, TX and Portland, OR. The company began manufacturing product in 1992, and in 1995 achieved ISO 9001 certification. UCT offers added value by providing original equipment manufacturers with integrated gas and liquid delivery solutions that enhance semiconductor manufacturing capital equipment. For more information about UCT, visit the company's web site and career page at: www.uct.com


For more information, please contact:
Ms. Sowmya Krishnan, Ph.D.
Ultra Clean Technology
150 Independence Drive, Menlo Park, CA 94025
(650) 323-4100 fax (650) 326-0929
skrishnan@uct.com

Media contact:
Ms. Teri Douglas
Robert Goldberg & Associates
315 Central Avenue, Alameda, CA 94501
(510) 238-0800 fax (510) 238-8554
teri@adfarm.com

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